Scanning Electron Microscopy
Instruments:
JEOL 7001F SEM workflow (MWAC EMU production)
SEM imaging using the FEI nova NanoSEM 450 (MWAC EMU production)
Hitachi TM4000Plus Benchtop SEM workflow (MWAC EMU production)
Hitachi TM4000Plus Benchtop SEM EDS workflow (MWAC EMU production)
SEM imaging using the Hitachi S3400 (MWAC EMU production)
EBSD data collection workflow (Jeol 7001F SEM) (MWAC EMU production)
FEI Nova NanoSEM EDS workflow (MWAC EMU production)
Hitachi S3400 EDS workflow (MWAC EMU production)
EDS data processing (ESPIRIT 2.1) (MWAC EMU production)
EDS data processing (ESPIRIT 1.9) (MWAC EMU production)
EDS data processing (ESPIRIT Compact) (MWAC EMU production)
Specimen preparation:
Sputter coating using the Q300T (MWAC EMU production)
Carbon coating workflow (MWAC EMU production)
Mounting samples for SEM: bulk samples (MWAC EMU production)
Sample mounting for SEM: Powdered samples (MWAC EMU production)
Samples mounting for SEM: Nanoparticles or particles in suspension (MWAC EMU production)
Sample mounting for SEM: Conductive silver liquid (MWAC EMU production)
Leica EM ACE600 Sputter Coating Workflow (MWAC EMU production)